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OpenLithoHub

Open-source computational lithography benchmarking and workflow toolkit for advanced EUV/curvilinear mask processes.

Overview

OpenLithoHub provides a unified evaluation and workflow framework for computational lithography research. It bridges the gap between academic tensor-based optimization and industrial mask manufacturing.

┌─────────────────────────────────────────────────────────┐
│                    OpenLithoHub                          │
├─────────────┬──────────────┬──────────────┬─────────────┤
│  Data Layer │  Benchmark   │   Workflow   │     CLI     │
│ LithoBench  │  EPE/PVBand  │ Tiling/Stitch│ eval        │
│ LithoSim    │  MRC/DRC     │ Contour Ext. │ optimize    │
│ Transforms  │  Stochastic  │ OASIS Export │ leaderboard │
│             │  Shot Count  │ B-spline Fit │             │
└─────────────┴──────────────┴──────────────┴─────────────┘

Key Features

  • Unified dataset access — single interface to LithoBench, LithoSim, and other lithography datasets
  • Standardized metrics — EPE, PV Band, shot count, EUV stochastic robustness
  • Manufacturing compliance — MRC/DRC rule checking as hard-fail gating
  • OASIS workflow — end-to-end pipeline from tensor to fab-ready mask (manhattan & curvilinear)
  • Model-agnostic evaluation — plug any OPC/ILT model into the benchmark via a minimal interface
  • Public leaderboard — track SOTA results across models, datasets, and process nodes